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Atmospheric Pressure Chemical Vapor Deposition System is widely applied to semiconductor and solar cells.

  • It’s currently applied in Taiwan. – AMAX800V AP-CVD.
  • Variety types of films like SiO2, BPSG, BSG, PSG, AlOx.
  • Deposite films at wide range of temperature from 200°C to 500°C.
  • The Sale of AMAYA AP-CVD’s parts.
  • On-Site Service for AMAYA AP-CVD.
  • The modification of AMAYA AP-CVD’s software and hardware.